A Lithographic System and Method

A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter con...

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Bibliographische Detailangaben
Hauptverfasser:	RILPHO LUDOVICUS DONKER, ERIK ROELOF LOOPSTRA, HAN-KWANG NIENHUYS, VADIM YEVGENYEVICH BANINE, WILFRED EDWARD ENDENDIJK
Format:	Patent
Sprache:	dut ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter configured to split the second radiation beam into a second plurality of sub-beams, and a switch assembly, wherein the switch assembly is configured to receive a first sub-beam which is one of the first plurality of sub-beams; receive a second sub-beam which is one of the second plurality of sub-beams, in a first configuration to transmit the first sub-beam along a desired path, and in a second configuration to transmit the second sub-beam along said desired path.