EUV SOURCE CHAMBER AND GAS FLOW REGIME FOR LITHOGRAPHIC APPARATUS, MULTI-LAYER MIRROR AND LITHOGRAPHIC APPARATUS

Disclosed is a radiation source module, and associated method of transporting fuel debris out of a source chamber. The radiation source module generates a radiation producing plasma at a plasma formation site by excitation of a fuel. The radiation source comprises: a source chamber; a radiation coll...

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Bibliographische Detailangaben
Hauptverfasser:	DENIS ALEXANDROVICH GLUSHKOV, CHRISTIANUS WILHELMUS JOHANNES BERENDSEN, HEINE MELLE MULDER, ANDREI MIKHAILOVICH YAKUNIN, DZMITRY LABETSKI, WILLEM VAN SCHAIK, ANDREY SERGEEVICH TYCHKOV, DMITRY IGOREVICH ASTAKHOV, CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE CLOIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a radiation source module, and associated method of transporting fuel debris out of a source chamber. The radiation source module generates a radiation producing plasma at a plasma formation site by excitation of a fuel. The radiation source comprises: a source chamber; a radiation collector within the source chamber for collecting and focusing said radiation; a primary buffer gas inlet for admitting a primary buffer gas into the source chamber; and a buffer gas outlet in the vicinity of said radiation collector, for exhausting said primary buffer gas from the source chamber. Also disclosed is a multi-layer mirror, and in particular a radiation collector, comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer.