Lithographic Apparatus and Method
Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajec...
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creator | WILHELMUS PATRICK ELISABETH MARIA OP T ROOT MATHIJS LEONARDUS JOHAN VERHEES HERMAN PHILIP GODFRIED MARC WILHELMUS MARIA VAN DER WIJST HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL ARIJ JONATHAN RIJKE |
description | Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2016889A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2016889A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2016889A3</originalsourceid><addsrcrecordid>eNrjZFD0ySzJyE8vSizIyExWcCwoSCxKLCktVkjMS1HwTQVKpfAwsKYl5hSn8kJpbgZ5N9cQZw_d1IL8-NTigsTk1LzUkng_HyMDQzMLC0tHY8IqAPBWJN0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic Apparatus and Method</title><source>esp@cenet</source><creator>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT ; MATHIJS LEONARDUS JOHAN VERHEES ; HERMAN PHILIP GODFRIED ; MARC WILHELMUS MARIA VAN DER WIJST ; HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL ; ARIJ JONATHAN RIJKE</creator><creatorcontrib>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT ; MATHIJS LEONARDUS JOHAN VERHEES ; HERMAN PHILIP GODFRIED ; MARC WILHELMUS MARIA VAN DER WIJST ; HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL ; ARIJ JONATHAN RIJKE</creatorcontrib><description>Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.</description><language>dut ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170117&DB=EPODOC&CC=NL&NR=2016889A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170117&DB=EPODOC&CC=NL&NR=2016889A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT</creatorcontrib><creatorcontrib>MATHIJS LEONARDUS JOHAN VERHEES</creatorcontrib><creatorcontrib>HERMAN PHILIP GODFRIED</creatorcontrib><creatorcontrib>MARC WILHELMUS MARIA VAN DER WIJST</creatorcontrib><creatorcontrib>HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL</creatorcontrib><creatorcontrib>ARIJ JONATHAN RIJKE</creatorcontrib><title>Lithographic Apparatus and Method</title><description>Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD0ySzJyE8vSizIyExWcCwoSCxKLCktVkjMS1HwTQVKpfAwsKYl5hSn8kJpbgZ5N9cQZw_d1IL8-NTigsTk1LzUkng_HyMDQzMLC0tHY8IqAPBWJN0</recordid><startdate>20170117</startdate><enddate>20170117</enddate><creator>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT</creator><creator>MATHIJS LEONARDUS JOHAN VERHEES</creator><creator>HERMAN PHILIP GODFRIED</creator><creator>MARC WILHELMUS MARIA VAN DER WIJST</creator><creator>HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL</creator><creator>ARIJ JONATHAN RIJKE</creator><scope>EVB</scope></search><sort><creationdate>20170117</creationdate><title>Lithographic Apparatus and Method</title><author>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT ; MATHIJS LEONARDUS JOHAN VERHEES ; HERMAN PHILIP GODFRIED ; MARC WILHELMUS MARIA VAN DER WIJST ; HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL ; ARIJ JONATHAN RIJKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2016889A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>dut ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT</creatorcontrib><creatorcontrib>MATHIJS LEONARDUS JOHAN VERHEES</creatorcontrib><creatorcontrib>HERMAN PHILIP GODFRIED</creatorcontrib><creatorcontrib>MARC WILHELMUS MARIA VAN DER WIJST</creatorcontrib><creatorcontrib>HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL</creatorcontrib><creatorcontrib>ARIJ JONATHAN RIJKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WILHELMUS PATRICK ELISABETH MARIA OP T ROOT</au><au>MATHIJS LEONARDUS JOHAN VERHEES</au><au>HERMAN PHILIP GODFRIED</au><au>MARC WILHELMUS MARIA VAN DER WIJST</au><au>HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL</au><au>ARIJ JONATHAN RIJKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic Apparatus and Method</title><date>2017-01-17</date><risdate>2017</risdate><abstract>Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.</abstract><oa>free_for_read</oa></addata></record> |
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language | dut ; eng |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Lithographic Apparatus and Method |
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