Lithographic Apparatus and Method

Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajec...

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Hauptverfasser: WILHELMUS PATRICK ELISABETH MARIA OP T ROOT, MATHIJS LEONARDUS JOHAN VERHEES, HERMAN PHILIP GODFRIED, MARC WILHELMUS MARIA VAN DER WIJST, HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL, ARIJ JONATHAN RIJKE
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creator WILHELMUS PATRICK ELISABETH MARIA OP T ROOT
MATHIJS LEONARDUS JOHAN VERHEES
HERMAN PHILIP GODFRIED
MARC WILHELMUS MARIA VAN DER WIJST
HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL
ARIJ JONATHAN RIJKE
description Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Lithographic Apparatus and Method
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