Lithographic Apparatus and Method

Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajec...

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Bibliographische Detailangaben
Hauptverfasser:	WILHELMUS PATRICK ELISABETH MARIA OP T ROOT, MATHIJS LEONARDUS JOHAN VERHEES, HERMAN PHILIP GODFRIED, MARC WILHELMUS MARIA VAN DER WIJST, HUBERTUS PETRUS LEONARDUS HENRICA VAN BUSSEL, ARIJ JONATHAN RIJKE
Format:	Patent
Sprache:	dut ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.