Radiation Source, Lithographic Apparatus and Device Manufacturing Method

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source wherein a buffer liquid droplet is provided in a source chamber containing the plasma source. The buffer liquid droplet being evaporated explosively to form a 5 buffer gas within the source chamber. Wherein...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	JOHANNES CHRISTIAAN LEONARDUS FRANKEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	A radiation source for a lithographic apparatus, in particular a laser-produced plasma source wherein a buffer liquid droplet is provided in a source chamber containing the plasma source. The buffer liquid droplet being evaporated explosively to form a 5 buffer gas within the source chamber. Wherein the buffer gas may deflect physical debris in the source chamber to reduce or prevent physical debris from passing out of an opening in the source chamber into other parts of the lithographic apparatus.