A Fluid Handling Structure, A Lithographic Apparatus and a Device Manufacturing Method

A Fluid Handling Structure, A Lithographic Apparatus and a Device Manufacturing Method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas 5 supply opening in the radially...

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Bibliographische Detailangaben
Hauptverfasser: VICTOR MANUEL BLANCO CARBALLO, WALTER THEODORUS MATHEUS STALS, RONALD VAN DER HAM, FREDERIK ANTONIUS VAN DER ZANDEN, CORNELIUS MARIA ROPS, WILHELMUS ANTONIUS WERNAART, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, DAVID BESSEMS, GIOVANNI LUCA GATTOBIGIO
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas 5 supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.