Reticle cooling by non-uniform gas flow

An apparatus, system, and method cool a patterning device by supplying a non- uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configur...

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Bibliographische Detailangaben
Hauptverfasser:	DANIEL NATHAN BURBANK, SANTIAGO E. DELPUERTO, CHRISTOPHER CHARLES WARD, THOMAS VENTURINO, JOHANNES ONVLEE, LAURENTIUS JOHANNES ADRIANUS VAN BOKHOVEN, GEOFFREY SCHULTZ, DANIEL NICHOLAS GALBURT, HERMAN VOGEL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An apparatus, system, and method cool a patterning device by supplying a non- uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater 5 volume or velocity of the gas flow is directed to desired portion of the patterning device.