Projection System

A projection system for a lithographic apparatus comprises: an optical path; a plurality of sensors; one or more actuators; and a controller. The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path co...

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Bibliographische Detailangaben

Hauptverfasser:	CHRISTIAAN LOUIS VALENTIN, LEON LEONARDUS FRANCISCUS MERKX, ROEL JOHANNES ELISABETH MERRY, MICHAEL FREDERIK YPMA, BOB STREEFKERK, ROBERTUS JOHANNES MARINUS DE JONGH, WILHELMUS FRANCISCUS JOHANNES SIMONS, HANS BUTLER, RAOUL MAARTEN SIMON KNOPS, JAN BERNARD PLECHELMUS VAN SCHOOT
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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