Projection System
A projection system for a lithographic apparatus comprises: an optical path; a plurality of sensors; one or more actuators; and a controller. The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path co...
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| creator | CHRISTIAAN LOUIS VALENTIN LEON LEONARDUS FRANCISCUS MERKX ROEL JOHANNES ELISABETH MERRY MICHAEL FREDERIK YPMA BOB STREEFKERK ROBERTUS JOHANNES MARINUS DE JONGH WILHELMUS FRANCISCUS JOHANNES SIMONS HANS BUTLER RAOUL MAARTEN SIMON KNOPS JAN BERNARD PLECHELMUS VAN SCHOOT |
| description | A projection system for a lithographic apparatus comprises: an optical path; a plurality of sensors; one or more actuators; and a controller. The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path comprises: a plurality of optical elements, the plurality of optical 5 elements comprising: a first set of at least two optical elements and a second set of at least one optical element. Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of 10 optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements. |
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The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path comprises: a plurality of optical elements, the plurality of optical 5 elements comprising: a first set of at least two optical elements and a second set of at least one optical element. Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of 10 optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160920&DB=EPODOC&CC=NL&NR=2015791A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160920&DB=EPODOC&CC=NL&NR=2015791A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHRISTIAAN LOUIS VALENTIN</creatorcontrib><creatorcontrib>LEON LEONARDUS FRANCISCUS MERKX</creatorcontrib><creatorcontrib>ROEL JOHANNES ELISABETH MERRY</creatorcontrib><creatorcontrib>MICHAEL FREDERIK YPMA</creatorcontrib><creatorcontrib>BOB STREEFKERK</creatorcontrib><creatorcontrib>ROBERTUS JOHANNES MARINUS DE JONGH</creatorcontrib><creatorcontrib>WILHELMUS FRANCISCUS JOHANNES SIMONS</creatorcontrib><creatorcontrib>HANS BUTLER</creatorcontrib><creatorcontrib>RAOUL MAARTEN SIMON KNOPS</creatorcontrib><creatorcontrib>JAN BERNARD PLECHELMUS VAN SCHOOT</creatorcontrib><title>Projection System</title><description>A projection system for a lithographic apparatus comprises: an optical path; a plurality of sensors; one or more actuators; and a controller. The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path comprises: a plurality of optical elements, the plurality of optical 5 elements comprising: a first set of at least two optical elements and a second set of at least one optical element. Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of 10 optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAMKMrPSk0uyczPUwiuLC5JzeVhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfF-PkYGhqbmloaOxoRVAABndx76</recordid><startdate>20160920</startdate><enddate>20160920</enddate><creator>CHRISTIAAN LOUIS VALENTIN</creator><creator>LEON LEONARDUS FRANCISCUS MERKX</creator><creator>ROEL JOHANNES ELISABETH MERRY</creator><creator>MICHAEL FREDERIK YPMA</creator><creator>BOB STREEFKERK</creator><creator>ROBERTUS JOHANNES MARINUS DE JONGH</creator><creator>WILHELMUS FRANCISCUS JOHANNES SIMONS</creator><creator>HANS BUTLER</creator><creator>RAOUL MAARTEN SIMON KNOPS</creator><creator>JAN BERNARD PLECHELMUS VAN SCHOOT</creator><scope>EVB</scope></search><sort><creationdate>20160920</creationdate><title>Projection System</title><author>CHRISTIAAN LOUIS VALENTIN ; LEON LEONARDUS FRANCISCUS MERKX ; ROEL JOHANNES ELISABETH MERRY ; MICHAEL FREDERIK YPMA ; BOB STREEFKERK ; ROBERTUS JOHANNES MARINUS DE JONGH ; WILHELMUS FRANCISCUS JOHANNES SIMONS ; HANS BUTLER ; RAOUL MAARTEN SIMON KNOPS ; JAN BERNARD PLECHELMUS VAN SCHOOT</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2015791A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHRISTIAAN LOUIS VALENTIN</creatorcontrib><creatorcontrib>LEON LEONARDUS FRANCISCUS MERKX</creatorcontrib><creatorcontrib>ROEL JOHANNES ELISABETH MERRY</creatorcontrib><creatorcontrib>MICHAEL FREDERIK YPMA</creatorcontrib><creatorcontrib>BOB STREEFKERK</creatorcontrib><creatorcontrib>ROBERTUS JOHANNES MARINUS DE JONGH</creatorcontrib><creatorcontrib>WILHELMUS FRANCISCUS JOHANNES SIMONS</creatorcontrib><creatorcontrib>HANS BUTLER</creatorcontrib><creatorcontrib>RAOUL MAARTEN SIMON KNOPS</creatorcontrib><creatorcontrib>JAN BERNARD PLECHELMUS VAN SCHOOT</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHRISTIAAN LOUIS VALENTIN</au><au>LEON LEONARDUS FRANCISCUS MERKX</au><au>ROEL JOHANNES ELISABETH MERRY</au><au>MICHAEL FREDERIK YPMA</au><au>BOB STREEFKERK</au><au>ROBERTUS JOHANNES MARINUS DE JONGH</au><au>WILHELMUS FRANCISCUS JOHANNES SIMONS</au><au>HANS BUTLER</au><au>RAOUL MAARTEN SIMON KNOPS</au><au>JAN BERNARD PLECHELMUS VAN SCHOOT</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Projection System</title><date>2016-09-20</date><risdate>2016</risdate><abstract>A projection system for a lithographic apparatus comprises: an optical path; a plurality of sensors; one or more actuators; and a controller. The optical path is operable to receive an input radiation beam and to project an output radiation beam onto a substrate to form an image. The optical path comprises: a plurality of optical elements, the plurality of optical 5 elements comprising: a first set of at least two optical elements and a second set of at least one optical element. Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of 10 optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Projection System |
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