A Lithographic Apparatus and a Method of Manufacturing a Lithographic Apparatus

A Lithographic Apparatus and a Method of Manufacturing a Lithographic Apparatus

A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specifi...

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Hauptverfasser: SIEGFRIED ALEXANDER TROMP, ADRIANUS HENDRIK KOEVOETS, ANDRE BERNARDUS JEUNINK, CHRISTIANUS WILHELMUS JOHANNES BERENDSEN, JIM VINCENT OVERKAMP, ROGIER HENDRIKUS MAGDALENA CORTIE, VAN VUONG VY, DANIEL ELZA ROELAND AUDENAERDT
Format: Patent
Sprache:dut
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.