Lithographic Apparatus and Method

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

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Bibliographische Detailangaben
Hauptverfasser:	ANKO JOZEF CORNELUS SIJBEN, JOHANNES HENRICUS WILHELMUS JACOBS, HENRICUS PETRUS VERSTEIJNEN, HENDRIKUS JOHANNES MARINUS VAN ABEELEN, JOOST JEROEN OTTENS, MARTINUS HENDRIKUS ANTONIUS LEENDERS, WOUTERUS JOHANNES PETRUS MARIA MAAS, PAULA STEFFENS, FRITS VAN DER MEULEN
Format:	Patent
Sprache:	dut
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.