PHOTOSENSITIVE RESIN LAMINATE AND METHOD FOR PRODUCING RESIST PATTERN

A photosensitive resin laminate provided with a support film and a photosensitive resin composition layer that includes a photosensitive resin composition, wherein: the photosensitive resin composition includes (A) an alkali-soluble polymer; the support film can be separated from the photosensitive...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOTANI, YUZO, INOUE, KOSUKE, KUNIMATSU, SHINICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A photosensitive resin laminate provided with a support film and a photosensitive resin composition layer that includes a photosensitive resin composition, wherein: the photosensitive resin composition includes (A) an alkali-soluble polymer; the support film can be separated from the photosensitive resin composition layer; and the water content included in the photosensitive resin composition layer is 0.1% by mass or more, where the total mass of the photosensitive resin composition layer is 100% by mass.