POLISHING COMPOSITION, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING MAGNETIC DISK SUBSTRATE

The polishing composition provided herein comprises an abrasive, an acid, a polymer, an oxidant, and water. The polishing composition has an abrasive content W % by weight. When the polishing composition is separated into liquid and solid phases, the resulting solution has a Na ion concentration C p...

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Bibliographische Detailangaben
Hauptverfasser:	Tomohide KAMIYA, Takaharu OYAMA, Noritaka YOKOMICHI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING
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Beschreibung
Zusammenfassung:	The polishing composition provided herein comprises an abrasive, an acid, a polymer, an oxidant, and water. The polishing composition has an abrasive content W % by weight. When the polishing composition is separated into liquid and solid phases, the resulting solution has a Na ion concentration C ppm while the C/W ratio value is 20 or less.