FEPT-C-BASED SPUTTERING TARGET
Through the present invention, a thin film containing an FePt-based alloy and carbon, the thin film being capable of being used as a magnetic recording medium, is enabled to be formed using one target, and amount of particles is enabled to be reduced. An FePt-C-based sputtering target containing Fe,...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Through the present invention, a thin film containing an FePt-based alloy and carbon, the thin film being capable of being used as a magnetic recording medium, is enabled to be formed using one target, and amount of particles is enabled to be reduced. An FePt-C-based sputtering target containing Fe, Pt, and C, wherein the FePt-C-based sputtering target has a structure in which a C phase substantially being C is dispersed in an FePt-based alloy phase containing 33 mol% or more and 60 mol% or less of Pt with the balance substantially being Fe, an average value of the size indices a of the C phase is 4.0 ?m or more and 9.0 ?m or less, and an average value of the nonspherical indices b of the C phase is 3.0 or more. |
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