IN-LINE METROLOGY SYSTEM AND METHOD
A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes. FIG.1
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes. FIG.1 |
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