APPARATUS AND PROCESS FOR DEPOSITING A THIN LAYER OF RESIST ON A SUBSTRATE

The present inventions relate to the formation of a thin polymer film on a substrate (120). Apparatus is described for transforming a solid polymer resist into an aerosol of small particles, electrostatically charging and depositing the particles onto a substrate (120), and flowing the particles int...

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Bibliographische Detailangaben
Hauptverfasser: SACHS,EMANUEL M, DANNER,GUY M, GATES,HOLLY G, KANE,PETER E, MADDEN,PETER G, TARASOV,VLADIMIR S
Format: Patent
Sprache:eng
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Zusammenfassung:The present inventions relate to the formation of a thin polymer film on a substrate (120). Apparatus is described for transforming a solid polymer resist into an aerosol of small particles, electrostatically charging and depositing the particles onto a substrate (120), and flowing the particles into a continuous layer. Apparatus is further described for transforming solid resist into an aerosol of small particles by heating the resist to form a low viscosity liquid such as is compatible with nebulization and applying the techniques of jet or impact nebulization and aerosol particle sizing to form the aerosol. A method is further described of using ionized gas to confer charge onto the aerosol particles and using a progression of charging devices establish an electric field (403) directing the flow of charged particles to the substrate (120). The progression of charging devices and associated apparatus results in high collection efficiency for the aerosol particles. (Figure 1)