COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL

The composition for forming an n-type diffusion layer (12) in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer (12) and a photovoltaic cell having an n-type diffusion layer (12) are prepared by applying the comp...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ADACHI, Shuuichirou, AOYAGI, Takuya, NOJIRI, Takeshi, OKANIWA, Kaoru, MACHII, Youichi, YOSHIDA, Masato, IWAMURO, Mitsunori
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The composition for forming an n-type diffusion layer (12) in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer (12) and a photovoltaic cell having an n-type diffusion layer (12) are prepared by applying the composition for forming an n-type diffusion layer (12), followed by a thermal diffusion treatment.