METHODS AND COMPOSITIONS FOR DOPING SILICON SUBSTRATES WITH MOLECULAR MONOLAYERS

COMPOSITIONS AND METHODS FOR DOPING SILICON SUBSTRATES BY TREATING THE SUBSTRATE WITH A DILUTED DOPANT SOLUTION COMPRISING TETRAETHYLENE GLYCOL DIMETHYL ETHER (TETRAGLYME) AND A DOPANT-CONTAINING MATERIAL AND SUBSEQUENTLY DIFFUSING THE DOPANT INTO THE SURFACE BY RAPID THERMAL ANNEALING. DIETHYLI - 1PROPYIPHOSPHONATE AND ALLYLBORONIC ACID PINACOL ESTER ARE PREFERRED DOPANT-CONTAINING MATERIALS, AND ARE PREFERABLY INCLUDED IN THE DILUTED DOPANT SOLUTION IN AN AMOUNT RANGING FROM ABOUT 1 % TO ABOUT 20%, WITH A DOPANT AMOUNT OF 4% OR LESS BEING MORE PREFERRED.