SUBSTRATE POLISHING METHOD AND DEVICE THEREOF

A CIRCULAR SUBSTRATE IS HELD AND ROTATED BY A HOLDING/ROTATING MECHANISM, A POLISHING TAPE IS TRANSFERRED INTERMITTENTLY OR CONTINUOUSLY BY A TAPE TRANSFER MECHANISM, A DETOUR POLISHING PART IN A TAPE POLISHING MECHANISM IS PRESSURE-CONTACTED TO AN INNER PERIPHERAL END SURFACE OF A ROUND HOLE BY A P...

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Hauptverfasser: JUN WATANABE, TETSUJIRO TADA, ISAMU OGURO, NOBUKAZU HOSOKAI
Format: Patent
Sprache:eng
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Zusammenfassung:A CIRCULAR SUBSTRATE IS HELD AND ROTATED BY A HOLDING/ROTATING MECHANISM, A POLISHING TAPE IS TRANSFERRED INTERMITTENTLY OR CONTINUOUSLY BY A TAPE TRANSFER MECHANISM, A DETOUR POLISHING PART IN A TAPE POLISHING MECHANISM IS PRESSURE-CONTACTED TO AN INNER PERIPHERAL END SURFACE OF A ROUND HOLE BY A PRESSURE-CONTACTING MECHANISM, THE DETOUR POLISHING PART IS ROCKED INTERMITTENTLY OR CONTINUOUSLY IN A DIRECTION OPPOSITE TO THE INNER PERIPHERAL END SURFACE BY A POLISHING PART ROCKING MECHANISM TO POLISH THE SURFACE INTO A CHAMFERED SURRACE OR A ROUND SURFACE, WHEREA SUBSTRATE POLISHING DEVICE INCLUDES A TAPE TRANSFER MECHANISM C, A TAPE POLISHING MECHANISM D WITH A DETOUR POLISHING PART K CONSISTING OF A SIDEWARD DETOURING PORTION T3 OF THE POLISHING TAPE T GUIDED TO DETOUR SIDEWARD BY A DETOUR GUIDE PART C3 FOR POLISHING AN INNER PERIPHERAL END SURFACE M OF A ROUND HOLE Q, AND A POLISHING PART ROCKING MECHANISM F.