POLISHING COMPOSITION

THE PRESENT INVENTION RELATES TO A POLISHING COMPOSITION MORE SUITABLE FOR USE IN POLISHING A SUBSTRATE FOR A MAGNETIC DISK. THE POLISHING COMPOSITION INCLUDES SILICON DIOXIDE, A PHOSPHORUS-CONTAINING COMPOUND CONTAINING AT LEAST ONE COMPOUND SELECTED FROM A SPECIFIC GROUP, AMMONIUM SALT CONTAINING...

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Bibliographische Detailangaben
Hauptverfasser:	YASUSHI MATSUNAMI, TOSHIKI OWAKI, JUNICHI HIRANO, NORITAKA YOKOMICHI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING
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Beschreibung
Zusammenfassung:	THE PRESENT INVENTION RELATES TO A POLISHING COMPOSITION MORE SUITABLE FOR USE IN POLISHING A SUBSTRATE FOR A MAGNETIC DISK. THE POLISHING COMPOSITION INCLUDES SILICON DIOXIDE, A PHOSPHORUS-CONTAINING COMPOUND CONTAINING AT LEAST ONE COMPOUND SELECTED FROM A SPECIFIC GROUP, AMMONIUM SALT CONTAINING AT LEAST ONE SALT PRODUCED BY A NEUTRALIZATION REACTION OF EACH OF SPECIFIC ACID WITH AMMONIA, HYDROGEN PEROXIDE, AND WATER.