METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER

A METHOD AND SYSTEM (100, 200) OF PROVIDING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION OPERATIONS IS PROVIDED. THE WATER IS TREATED BY UTILIZING A FREE RADICAL SCAVENGING SYSTEM (101) AND A FREE RADICAL REMOVAL SYSTEM (102). THE FREE RADICAL SCAVENGING SYSTEM (101) CAN UTILIZE ACTINIC RADIATION W...

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1. Verfasser: COULTER, BRUCE LEE
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description A METHOD AND SYSTEM (100, 200) OF PROVIDING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION OPERATIONS IS PROVIDED. THE WATER IS TREATED BY UTILIZING A FREE RADICAL SCAVENGING SYSTEM (101) AND A FREE RADICAL REMOVAL SYSTEM (102). THE FREE RADICAL SCAVENGING SYSTEM (101) CAN UTILIZE ACTINIC RADIATION WITH A FREE RADICAL PRECURSOR COMPOUND, SUCH AS AMMONIUM PERSULFATE. THE FREE RADICAL REMOVAL SYSTEM (102) CAN COMPRISE USE OF A REDUCING AGENT. THE ULTRAPURE WATER MAY BE FURTHER TREATED BY UTILIZING ION EXCHANGE MEDIA AND DEGASIFICATION APPARATUS. A CONTROL SYSTEM (105) CAN BE UTILIZED TO REGULATE ADDITION OF THE PRECURSOR COMPOUND, THE INTENSITY OF THE ACTINIC RADIATION, AND ADDITION OF THE REDUCING AGENT TO THE WATER. (FIG. 1)
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subjects CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
METALLURGY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
title METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER
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