METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER

A METHOD AND SYSTEM (100, 200) OF PROVIDING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION OPERATIONS IS PROVIDED. THE WATER IS TREATED BY UTILIZING A FREE RADICAL SCAVENGING SYSTEM (101) AND A FREE RADICAL REMOVAL SYSTEM (102). THE FREE RADICAL SCAVENGING SYSTEM (101) CAN UTILIZE ACTINIC RADIATION W...

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Bibliographische Detailangaben
1. Verfasser:	COULTER, BRUCE LEE
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	A METHOD AND SYSTEM (100, 200) OF PROVIDING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION OPERATIONS IS PROVIDED. THE WATER IS TREATED BY UTILIZING A FREE RADICAL SCAVENGING SYSTEM (101) AND A FREE RADICAL REMOVAL SYSTEM (102). THE FREE RADICAL SCAVENGING SYSTEM (101) CAN UTILIZE ACTINIC RADIATION WITH A FREE RADICAL PRECURSOR COMPOUND, SUCH AS AMMONIUM PERSULFATE. THE FREE RADICAL REMOVAL SYSTEM (102) CAN COMPRISE USE OF A REDUCING AGENT. THE ULTRAPURE WATER MAY BE FURTHER TREATED BY UTILIZING ION EXCHANGE MEDIA AND DEGASIFICATION APPARATUS. A CONTROL SYSTEM (105) CAN BE UTILIZED TO REGULATE ADDITION OF THE PRECURSOR COMPOUND, THE INTENSITY OF THE ACTINIC RADIATION, AND ADDITION OF THE REDUCING AGENT TO THE WATER. (FIG. 1)