ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS

THE PRESENT INVENTION RELATES TO A NOVEL ANTIREFLECTIVE COATING COMPOSITION COMPRISING A POLYMER, A CROSSLINKING AGENT AND AN ACID GENERATOR. THE PRESENT INVENTION FURTHER RELATES TO A PROCESS FOR USING THE NOVEL COMPOSITION, PARTICULARLY AT 193NM. THE POLYMER OF THE PRESENT INVENTION CONTAINS AT LEAST ONE UNIT SELECTED FROM STRUCTURES 1, 2 AND 3, WHERE, Y IS A HYDROCARBYL LINKING GROUP OF 1 TO ABOUT 10 CARBON ATOMS, R, R1, R' AND R'' ARE INDEPENDENTLY HYDROGEN, HYDROCARBYL GROUP OF 1 TO ABOUT 10 CARBON ATOMS, HALOGEN, -O(CO)Z, -C(CF3)2Z, -C(CF3)2(CO)OZ, -SO2CF3, -(CO)OZ, -SO3Z, -COZ, -OZ, -NZ2, -SZ, -SO2Z, -NHCOZ, -NZCOZ OR -SO2NZ2, WHERE Z IS H OR A HYDROCARBYL GROUP OF 1 TO ABOUT 10 CARBON ATOMS, N=1-4, X IS O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, AND WHERE L AND W ARE INDEPENDENTLY HYDROCARBYL GROUPS OF 1 TO ABOUT 10 CARBON ATOMS, AND M=0-3.