POLISHING LIQUID COMPOSITION

A POLISHING LIQUID COMPOSITION THAT MAKES IT POSSIBLE TO PROVIDE A POLISHED SUBSTRATE SURFACE ON WHICH SCRATCHES AND/OR WAVINESS ARE REDUCED, WITHOUT IMPAIRING PRODUCTIVITY, IS PROVIDED, AND FURTHER, A METHOD FOR MANUFACTURING AND POLISHING A SUBSTRATE USING THIS POLISHING LIQUID COMPOSITION IS PROV...

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Bibliographische Detailangaben
1. Verfasser:	TAIKI YOSHINO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING
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Beschreibung
Zusammenfassung:	A POLISHING LIQUID COMPOSITION THAT MAKES IT POSSIBLE TO PROVIDE A POLISHED SUBSTRATE SURFACE ON WHICH SCRATCHES AND/OR WAVINESS ARE REDUCED, WITHOUT IMPAIRING PRODUCTIVITY, IS PROVIDED, AND FURTHER, A METHOD FOR MANUFACTURING AND POLISHING A SUBSTRATE USING THIS POLISHING LIQUID COMPOSITION IS PROVIDED. THE POLISHING LIQUID COMPOSITION CONTAINS AN ABRASIVE, A WATER-SOLUBLE POLYMER, AND WATER, WHEREIN THE WATER-SOLUBLE POLYMER HAS A SULFONIC ACID GROUP, AND HAS AN AROMATIC RING IN EACH OF A MAIN CHAIN AND A SIDE CHAIN. THE METHOD FOR MANUFACTURING A SUBSTRATE, AND THE METHOD FOR POLISHING A SUBSTRATE, INCLUDE PERFORMING POLISHING BY SUPPLYING THE ABOVE-DESCRIBED POLISHING LIQUID COMPOSITION TO A SURFACE TO BE POLISHED OF A SUBSTRATE TO BE POLISHED, BRINGING A POLISHING PAD INTO CONTACT WITH THE SURFACE TO BE POLISHED, AND MOVING THE POLISHING PAD AND/OR THE SUBSTRATE TO BE POLISHED.