POLISHING COMPOSITION FOR NICKEL-PHOSPHOROUS MEMORY DISKS

THE INVENTION PROVIDES A CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ALPHA ALUMINA, FUMED ALUMINA, SILICA, AN OXIDIZING AGENT THAT OXIDIZES NICKEL-PHOSPHOROUS, OXALIC ACID, OPTIONALLY, TARTARIC ACID, OPTIONALLY, A NONIONIC SURFACTANT, OPTIONALLY, A BIOCIDE, AND WATER. THE INVENTION ALSO PRO...

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Hauptverfasser:	PALANISAMY CHINNATHAMBI, SELVARAJ, SIRIWARDANE, HARESH
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES
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Zusammenfassung:	THE INVENTION PROVIDES A CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ALPHA ALUMINA, FUMED ALUMINA, SILICA, AN OXIDIZING AGENT THAT OXIDIZES NICKEL-PHOSPHOROUS, OXALIC ACID, OPTIONALLY, TARTARIC ACID, OPTIONALLY, A NONIONIC SURFACTANT, OPTIONALLY, A BIOCIDE, AND WATER. THE INVENTION ALSO PROVIDES A METHOD OF CHEMICALLY-MECHANICALLY POLISHING A SUBSTRATE COMPRISING CONTACTING A SUBSTRATE WITH A POLISHING PAD AND THE CHEMICAL-MECHANICAL POLISHING COMPOSITION, MOVING THE POLISHING PAD AND THE POLISHING COMPOSITION RELATIVE TO THE SUBSTRATE, AND ABRADING AT LEAST A PORTION OF THE SUBSTRATE TO POLISH THE SUBSTRATE. (NO SUITABLE