IN-SITU CLEANING OF AN IMPRINT LITHOGRAPHY TOOL

IMPRINT LITHOGRAPHY SYSTEM (10) MAY PROVIDE FOR AN ENERGY SOURCE FOR SOLIDIFICATION OF MATERIAL POSITIONED BETWEEN A TEMPLATE (18) AND A SUBSTRATE (12). ADDITIONALLY, THE ENERGY SOURCE AND/OR AN ADDITIONAL ENERGY SOURCE MAY BE USED TO CLAIM CONTAMINANTS FROM THE TEMPLATE (18) AND/OR THE SUBSTRATE.

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Bibliographische Detailangaben
Hauptverfasser:	RESNICK, DOUGLAS J, SCHMID, GERARD, MCMACKIN, IAN M, CHOI, BYUNG-JIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	IMPRINT LITHOGRAPHY SYSTEM (10) MAY PROVIDE FOR AN ENERGY SOURCE FOR SOLIDIFICATION OF MATERIAL POSITIONED BETWEEN A TEMPLATE (18) AND A SUBSTRATE (12). ADDITIONALLY, THE ENERGY SOURCE AND/OR AN ADDITIONAL ENERGY SOURCE MAY BE USED TO CLAIM CONTAMINANTS FROM THE TEMPLATE (18) AND/OR THE SUBSTRATE.