POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD

THE PRESENT INVENTION PROVIDES A METHOD TO PATTERN A SUBSTRATE WHICH FEATURES CREATING A MULTI-LAYERED STRUCTURE BY FORMING, ON THE SUBSTRATE, A PATTERNED LAYER HAVING PROTRUSIONS AND RECESSIONS. FORMED UPON THE PATTERNED LAYER IS A CONFORMAL LAYER, WITH THE MULTI-LAYERED STRUCTURE HAVING A CROWN SU...

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Bibliographische Detailangaben
Hauptverfasser:	FRANK Y. XU, MICHAEL N. MILLER, SIDLGATA V. SREENIVASAN, MICHAEL P.C. WATTS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DECORATIVE ARTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MOSAICS NANOTECHNOLOGY ORIGINALS THEREFOR PAPERHANGING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRODUCING DECORATIVE EFFECTS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TARSIA WORK TRANSPORTING
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Zusammenfassung:	THE PRESENT INVENTION PROVIDES A METHOD TO PATTERN A SUBSTRATE WHICH FEATURES CREATING A MULTI-LAYERED STRUCTURE BY FORMING, ON THE SUBSTRATE, A PATTERNED LAYER HAVING PROTRUSIONS AND RECESSIONS. FORMED UPON THE PATTERNED LAYER IS A CONFORMAL LAYER, WITH THE MULTI-LAYERED STRUCTURE HAVING A CROWN SURFACE FACING AWAY FROM THE SUBSTRATE. PORTIONS OF THE MULTI-LAYERED STRUCTURE ARE REMOVED TO EXPOSE REGIONS OF THE SUBSTRATE IN SUPERIMPOSITION WITH THE PROTRUSIONS, WHILE FORMING A HARD MASK IN AREAS OF THE CROWN SURFACE IN SUPERIMPOSITION WITH THE RECESSIONS.