CONTROLLED ELECTROCHEMICAL POLISHING METHOD

THE INVENTION RELATES TO A METHOD OF POLISHING A SUBSTRATE COMPRISING AT LEAST ONE METAL LAYER BY APPLYING AN ELECTROCHEMICAL POTENTIAL BETWEEN THE SUBSTRATE AND AT LEAST ONE ELECTRODE IN CONTACT WITH A POLISHING COMPOSITION COMPRISING A REDUCING AGENT OR AN OXIDIZING AGENT.

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Bibliographische Detailangaben
Hauptverfasser:	VLASTA BRUSIC, PAUL FEENEY
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
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Beschreibung
Zusammenfassung:	THE INVENTION RELATES TO A METHOD OF POLISHING A SUBSTRATE COMPRISING AT LEAST ONE METAL LAYER BY APPLYING AN ELECTROCHEMICAL POTENTIAL BETWEEN THE SUBSTRATE AND AT LEAST ONE ELECTRODE IN CONTACT WITH A POLISHING COMPOSITION COMPRISING A REDUCING AGENT OR AN OXIDIZING AGENT.