METHOD AND APPARATUS FOR PROCESSING WAFER SURFACES USING THIN, HIGH VELOCITY FLUID LAYER

AMONG THE MANY EMBODIMENT, IN ONE EMBODIMENT, A METHOD FOR PROCESSING A SUBSTRATE (108) IS DISCLOSED WHICH INCLUDES GENERATING A FLUID LAYER ON A SURFACE OF THE SUBSTRATE (108), THE FLUID LAYER DEFINING A FLUID MENISCUS (116). THE GENERATING INCLUDES MOVING A HEAD (106) IN PROXIMITY TO THE SURFACE,...

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Hauptverfasser:	FRITZ REDEKER, CHRISTIAN DIPIETRO, MICHAEL RAVKIN, MIKHAIL KOROLIK, MICHAEL G. R. SMITH, JOHN M. DE LARIOS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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Zusammenfassung:	AMONG THE MANY EMBODIMENT, IN ONE EMBODIMENT, A METHOD FOR PROCESSING A SUBSTRATE (108) IS DISCLOSED WHICH INCLUDES GENERATING A FLUID LAYER ON A SURFACE OF THE SUBSTRATE (108), THE FLUID LAYER DEFINING A FLUID MENISCUS (116). THE GENERATING INCLUDES MOVING A HEAD (106) IN PROXIMITY TO THE SURFACE, APPLYING A FLUID FROM THE HEAD (106) TO THE SURFACE WHILE THE HEAD (106) IS IN PROXIMITY TO THE SURFACE OF THE SUBSTRATE (108) TO DEFINE THE FLUID LAYER, AND REMOVING THE FLUID FROM THE SURFACE THROUGH THE PROXIMITY HEAD BY A VACUUM (312). THE FLUID TRAVELS ALONG THE FLUID LAYER BETWEEN THE HEAD (106) AND THE SUBSTRATE (108) AT A VELOCITY THAT INCREASES AS THE HEAD (106) IS IN CLOSER PROXIMITY TO THE SURFACE.