SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME
A SEMICONDUCTOR DEVICE HAVING A HIGHLY RELIABLE GROOVE ISOLATION STRUCTURE WITH A DESIRED RADIUS OF CURVATURE FORMED AT THE GROOVE (4A) UPPER EDGE AND WITHOUT FORMATION OF ANY STEP, THERE IS PRODUCED BY REDUCING THE STRESS GENERATION AROUND THE GROOVE (4A) UPPER EDGE OF AN ELEMENT ISOLATION GROOVE (...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A SEMICONDUCTOR DEVICE HAVING A HIGHLY RELIABLE GROOVE ISOLATION STRUCTURE WITH A DESIRED RADIUS OF CURVATURE FORMED AT THE GROOVE (4A) UPPER EDGE AND WITHOUT FORMATION OF ANY STEP, THERE IS PRODUCED BY REDUCING THE STRESS GENERATION AROUND THE GROOVE (4A) UPPER EDGE OF AN ELEMENT ISOLATION GROOVE (4) ON A SEMICONDUCTOR SUBSTRATE (1), THEREBY OPTIMIZING THE SHAPE OF AN ELEMENT ISOLATION GROOVE (4) AND MAKING THE DEVICE FINER AND IMPROVING THE DEVICE ELECTRIC CHARACTERISTICS. |
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