VAPOUR DEPOSITION

The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapour deposition under...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	VELTHUIS, JOHANNES, FRANCISCUS, MARIA
Format:	Patent
Sprache:	eng ; spa
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapour deposition under choking conditions. La invencion es concerniente con un proceso para aplicar un recubrimiento a un sustrato, en donde el recubrimiento es formado de por lo menos dos componentes o elementos. En una modalidad preferida, el recubrimiento es formado de por lo menos dos metales. De acuerdo con la invencion, el recubrimiento es aplicado mediante deposicion de vapor bajo condiciones de regulacion.