PROCEDIMIENTO DE LIMPIEZA

Una composición limpiadora líquida que comprende un agente de solvatación y un agente de un enjuague, siendo la proporción de la presentación de vapor de dicho agente de enjuague a la presión de vapor de dicho agente de solvatación de por lo menos 20 y el uso de los mismos para limpiar substratos que tienen manchas adheridas a los mismos. PCT No. PCT/US92/04992 Sec. 371 Date Dec. 14, 1993 Sec. 102(e) Date Dec. 14, 1993 PCT Filed Jun. 15, 1992 PCT Pub. No. WO92/22678 PCT Pub. Date Dec. 23, 1992A process for removing soil from a substrate which includes the use of liquid cleaning composition including a solvating agent (for example, a monobasic ester) and a rinsing agent (for example, a perfluorocarbon), the solvating agent having: (i) a room temperature vapor pressure of no greater than about 40 mm Hg; and (ii) a solvating strength of no less than about 10; and the rinsing agent having: (iii) a room temperature vapor pressure of about 8 mm Hg to about 760 mm Hg; and (iv) an ozone depleting factor of no greater than about 0.15; wherein the ratio of the vapor pressure of the rinsing agent to the vapor pressure of the solvating agent is at least about 20 and such that, at the boiling temperature of the composition, the vapor space above the boiling composition would include the rinsing agent and be substantially free of the solvating agent, the process including immersing an article (for example, a printed circuit board having thereon solder flux) in the boiling composition, withdrawing the article from the composition and transferring it through the vapor space and into a container of relatively cool liquid rinsing agent from which it is withdrawn and transferred through vaporized rinsing agent and dried, and apparatus for carrying out the process.