SKIN CLEANSING COMPOSITION

Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5. Se describe una composición limpiadora par...

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Bibliographische Detailangaben
Hauptverfasser:	SHENG Saihong, SUN Yingqing, ZHU Sunxin, CAO Yixuan
Format:	Patent
Sprache:	eng ; spa
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE METALLURGY PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	Disclosed is a skin cleansing composition comprising anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or a mixture thereof; polypropylene glycol; and diol; wherein the weight ratio of the diol to the anionic surfactant is at least 1:5. Se describe una composición limpiadora para la piel que comprende un tensoactivo aniónico seleccionado de alquilsulfatos, alquilétersulfatos o una mezcla de los mismos; polipropilenglicol; y diol; en donde la proporción en peso del diol al tensoactivo aniónico es al menos 1:5.