Method for removing the deformation of ZnSe single crystals in the cooling process after growth

The invention relates to methods for producing semiconductor materials and can be used in semiconductor technology.The method for removing the deformation of ZnSe single crystals in the cooling process after growth, grown from gas phase, on the plane bottom of arbitrary thickness of the closed growt...

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Hauptverfasser: COLIBABA GLEB, NEDEOGLO DUMITRU
Format: Patent
Sprache:eng ; rum ; rum
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Zusammenfassung:The invention relates to methods for producing semiconductor materials and can be used in semiconductor technology.The method for removing the deformation of ZnSe single crystals in the cooling process after growth, grown from gas phase, on the plane bottom of arbitrary thickness of the closed growth chamber, consists in using the growth temperature within a range of 900...100°C, the temperature gradient in the crystallization region 0...5°C/cm, the grown crystal crystallization and cooling embryo heating rate 20...60°C/hour using a special profile of the furnace temperature required to eliminate the effect of crystal adhesion to the walls of the ampoule. Inventia se refera la procedee de obtinere a materialelor semiconductoare si poate fi utilizata în tehnologia semiconductoare.Procedeul de lichidare a deformatiei monocristalelor de ZnSe în procesul de racire dupa crestere, crescute din faza gazoasa, pe fundul plat de grosime arbitrara al camerei de crestere închise, consta în utilizarea temperaturii de crestere aflate în diapazonul 900...1100°C, a gradientului de temperatura în regiunea de cristalizare 0...5°C/cm, a vitezei de încalzire a germenului de cristalizare si de racire a cristalului crescut 20...60°C/ora cu utilizarea unui profil special de temperatura al cuptorului, necesar pentru lichidarea efectului de alipire a cristalelor de peretii fiolei.