INSTALLATION DE DÉPÔT SOUS VIDE ET PROCÉDÉ DE REVÊTEMENT D'UN SUBSTRAT

A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the...

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Bibliographische Detailangaben
Hauptverfasser: SILBERBERG, Eric, MARNEFFE, Didier, SCHMITZ, Bruno, PACE, Sergio
Format: Patent
Sprache:fre
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Beschreibung
Zusammenfassung:A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.