DEVICE FOR VACUUM SPUTTERING COATING

The invention relates to devices for making vacuum coatings. The proposed magnetron sputtering device is adapted to be inserted into a vacuum chamber and comprises two magnetrons mounted on a magnetron holder, each on its own axis of rotation, which is inserted in a guide adapted to fix the magnetro...

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Bibliographische Detailangaben
Hauptverfasser:	PURĀNS, Juris, ZUBKINS, Mārtiņš, ĀZENS, Andris
Format:	Patent
Sprache:	eng ; lav
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to devices for making vacuum coatings. The proposed magnetron sputtering device is adapted to be inserted into a vacuum chamber and comprises two magnetrons mounted on a magnetron holder, each on its own axis of rotation, which is inserted in a guide adapted to fix the magnetrons therein by means of fixation means, thus, the device is adapted to move and fix the magnetrons by optionally changing the distances between the magnetrons and from the magnetrons to the surface to be coated and their angular position to each other or to the surface to be coated, thus adjusting the spraying conditions of the coating to be made.