METHOD OF MANUFACTURING EXPOSURE APPARATUS

The method concurrently improves the focus degree between upper part and lower part by variation of focus point. The device includes a first conduction layer(7), a first insulation layer(8), a second insulation layer(9) on the silicon board(6), and the light development layer pattern forming means b...

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Bibliographische Detailangaben
Hauptverfasser:	HYON, IL - SON, KIL, MYONG - KUN, LEE, DU - HUI, KWON, WON - TAEK, KU, YONG - MO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The method concurrently improves the focus degree between upper part and lower part by variation of focus point. The device includes a first conduction layer(7), a first insulation layer(8), a second insulation layer(9) on the silicon board(6), and the light development layer pattern forming means between upper part(11) and lower part(12).