STRUCTURE OF STACKED TRENCH CAPACITOR AND FABRICATING METHOD THEREOF

Structure of stack trench capacitor formed by rounding the bottom portion of said trench and forming a multi-insulating layer by oxidizing polysilicone prevents current leakage.

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1. Verfasser: LEE, BYONG - IL
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:Structure of stack trench capacitor formed by rounding the bottom portion of said trench and forming a multi-insulating layer by oxidizing polysilicone prevents current leakage.