SURFACE CLEANING USING A CRYOGENIC AEROSOL

A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.

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Bibliographische Detailangaben
Hauptverfasser:	COOPER, DOGLUS W, OCKOVIC, RICHARD C, WOLFE, HENRY L, SCHWARZ, ALEXANDER, MCDERMOTT, WAYNE T, WU, JIN-JANG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GRINDING PERFORMING OPERATIONS POLISHING PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.