PATTERN SHAPING METHOD HAVING PHASE TRANSITION

The method comprises (a) causing the photoinduced anisotropy uniformly on a non-linear optical thin film (8) by exposing the thin film (8) to the light which is linearly polarized when the recording light source (9) passes through the polariscope (10), and (b) selectively forming a 90 -rotated light...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LEE, IL - HANG, KIM, HONG - MAN, KWAK, JONG - HUN, PARK, SO - YON
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The method comprises (a) causing the photoinduced anisotropy uniformly on a non-linear optical thin film (8) by exposing the thin film (8) to the light which is linearly polarized when the recording light source (9) passes through the polariscope (10), and (b) selectively forming a 90 -rotated light axis with respect to the photoinduced light axis using a 90 polariscope (11) and a binary photomask (3). The method provides the real-time (0,π) phase shift for non-linear optical materials only by a containuous 2- step photolighography exposing process without several etching steps needed in the conventional method.