SEMICONDUCTOR MANUFACTURING METHOD

growing thermal oxide film (21) on the top of the N-type epitaxial layer and forming the pattern of intrinsic base region (22) and extrinsic base region (23), respectively, by photograph and injecting P-type impurity into them ; Spreading said substrate with an oxide layer and etching only (4) and t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE HYONG-KUN, LEE SON-DONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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