조성물, 막 및 표시 장치

반도체 입자 (A)와 수지 (B)를 포함하는 조성물로서, 반도체 입자 (A)의 함유율이 조성물의 고형분의 총량에 대하여 30 질량% 초과인 조성물, 당해 조성물로부터 형성되는 막, 및, 당해 막을 포함하는 표시 장치가 제공된다. Provided are a composition, a film formed from the composition, and a display device including the film, the composition containing semiconductor particles (A) and a resin...

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Bibliographische Detailangaben
Hauptverfasser:	TOKUDA MASAYOSHI, NISHIKAWA YOSHINAGA YUKAKO, TSUCHIYA MITSUO, HAYASAKA KOMADA MEGUMI
Format:	Patent
Sprache:	kor
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	반도체 입자 (A)와 수지 (B)를 포함하는 조성물로서, 반도체 입자 (A)의 함유율이 조성물의 고형분의 총량에 대하여 30 질량% 초과인 조성물, 당해 조성물로부터 형성되는 막, 및, 당해 막을 포함하는 표시 장치가 제공된다. Provided are a composition, a film formed from the composition, and a display device including the film, the composition containing semiconductor particles (A) and a resin (B). The semiconductor particles (A) content is greater than 30 mass% in relation to the total amount of solids in the composition.