METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION AND METHOD OF FORMING PATTERNS INCOUDING STEP OF DEVELOPING USING THE COMPOSITION

유기 용매, 산 화합물, 및 상기 산 화합물의 짝염기 화합물을 포함하는, 금속 함유 포토레지스트 현상액 조성물, 및 이를 이용한 현상 단계를 포함하는 패턴 형성 방법을 제공한다. A metal-containing photoresist developer composition, and a method of forming patterns including a step (e.g., an act or task) of developing using the same are provided. The metal-containing photoresi...

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Bibliographische Detailangaben
Hauptverfasser:	SAKONG JUN, LIM WANHEE, MOON HYUNGRANG, CHOI YOOJEONG, LEE CHUNGHEON, SONG DAESEOK, SEONG TAEGEUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	유기 용매, 산 화합물, 및 상기 산 화합물의 짝염기 화합물을 포함하는, 금속 함유 포토레지스트 현상액 조성물, 및 이를 이용한 현상 단계를 포함하는 패턴 형성 방법을 제공한다. A metal-containing photoresist developer composition, and a method of forming patterns including a step (e.g., an act or task) of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, an acid compound, and a conjugate base compound of the acid compound.