Spindle unit and Substrate processing apparatus

본 발명은 스핀들유닛 및 기판처리장치에 대한 것으로서, 보다 상세하게는 복수개의 기판을 수용하여 처리할 수 있는 챔버 내측에 구비되어 기판을 빠른 속도로 이동시킬 수 있는 스핀들유닛 및 기판처리장치에 대한 것이다. The present invention relates to a shaft unit and a substrate processing apparatus, and more particularly, to a shaft unit and a substrate processing apparatus which are provided inside a chamber capable of accommodating and processing a plurality of substrates and can move the substrates at a high speed. The shaft unit is provided with: a rotating plate provided in the chamber so as to be rotatable and vertically movable; a rotation support bar rotatably provided on the rotation plate and capable of supporting a substrate; a rotation center shaft provided in the center of the rotation plate; and a plurality of links, one end of which is connected to the rotation center shaft and the other end of which is connected to the rotation support rod, so that the rotation support rod is rotated by the rotation of the rotation center shaft.