탄소 기반 층으로 코팅된 부품

본 발명은 탄소 기반 물질(M)의 층으로 코팅된 외부 표면을 갖는 금속 기재(S)를 포함하는 금속 부품에 관한 것이다. 본 발명에 따르면, 탄소 기반 물질의 층은: - a-C 계열로부터의 "DLC" 비정질 탄소 유형의 것이고; ● 탄소 기반 물질의 층 내에 3 at% 미만의 산소를 포함하고; ● 수소, 질소, 또는 도핑 원소를 함유하지 않는다. The invention relates to a method for depositing a carbon-based material from a target onto a me...

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Hauptverfasser: LEROY MARIE ALIX, OUGIER MICHAEL
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creator LEROY MARIE ALIX
OUGIER MICHAEL
description 본 발명은 탄소 기반 물질(M)의 층으로 코팅된 외부 표면을 갖는 금속 기재(S)를 포함하는 금속 부품에 관한 것이다. 본 발명에 따르면, 탄소 기반 물질의 층은: - a-C 계열로부터의 "DLC" 비정질 탄소 유형의 것이고; ● 탄소 기반 물질의 층 내에 3 at% 미만의 산소를 포함하고; ● 수소, 질소, 또는 도핑 원소를 함유하지 않는다. The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering.According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed toward the substrate is adjusted to between 1.7 and 3.5; and a bias voltage of between −35 V and −100 V is applied to the substrate.
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The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering.According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed toward the substrate is adjusted to between 1.7 and 3.5; and a bias voltage of between −35 V and −100 V is applied to the substrate.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB429zypq1H4dWODa83zFB4s2Prmzl7Xi-co_Bm75S3Pa2vJ8xReL2t4e2kDh4G1rTEnOJUXijNzaDs5hri7KGbWpAfn1pckJicmpdaEu8dZGRgZGJgYGJpZGnoaEycKgBH0DQj</recordid><startdate>20240416</startdate><enddate>20240416</enddate><creator>LEROY MARIE ALIX</creator><creator>OUGIER MICHAEL</creator><scope>EVB</scope></search><sort><creationdate>20240416</creationdate><title>탄소 기반 층으로 코팅된 부품</title><author>LEROY MARIE ALIX ; OUGIER MICHAEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240049291A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LEROY MARIE ALIX</creatorcontrib><creatorcontrib>OUGIER MICHAEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEROY MARIE ALIX</au><au>OUGIER MICHAEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>탄소 기반 층으로 코팅된 부품</title><date>2024-04-16</date><risdate>2024</risdate><abstract>본 발명은 탄소 기반 물질(M)의 층으로 코팅된 외부 표면을 갖는 금속 기재(S)를 포함하는 금속 부품에 관한 것이다. 본 발명에 따르면, 탄소 기반 물질의 층은: - a-C 계열로부터의 "DLC" 비정질 탄소 유형의 것이고; ● 탄소 기반 물질의 층 내에 3 at% 미만의 산소를 포함하고; ● 수소, 질소, 또는 도핑 원소를 함유하지 않는다. The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering.According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed toward the substrate is adjusted to between 1.7 and 3.5; and a bias voltage of between −35 V and −100 V is applied to the substrate.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title 탄소 기반 층으로 코팅된 부품
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