SILICON COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

본 발명의 기술적 사상에 따른 실리콘 화합물은 다음 화학식으로 표시된다. R1m(OR2)n(OR3)3-m-nSi-O-SiR4p(OR5)q(OR6)3-p-q 상기 화학식에서, m, n, p, 및 q는 각각 독립적으로 0 내지 3의 정수이고, m+p≥1, m+n≤3, 및 p+q≤3을 만족하고, R1은 헤테로사이클릭기이며, R4는 헤테로사이클릭기, 탄소 포화 작용기, 또는 탄소 불포화 작용기이며, R2, R3, R5, 및 R6는 각각 독립적으로 수소 원자, C1-C7 알킬, C1-C7 알케닐기, C1-C7 사이클로알킬기, 또는 C1-C7...

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Hauptverfasser:	SON SEUNG, KIM SUNG GI, HWANG SUN HYE, CHO YOUN JOUNG, PAKR GYU HEE, LEE JI HYUN, KIM YEONG HUN, LEE GYUN SANG, HWANG BYUNG KEUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	본 발명의 기술적 사상에 따른 실리콘 화합물은 다음 화학식으로 표시된다. R1m(OR2)n(OR3)3-m-nSi-O-SiR4p(OR5)q(OR6)3-p-q 상기 화학식에서, m, n, p, 및 q는 각각 독립적으로 0 내지 3의 정수이고, m+p≥1, m+n≤3, 및 p+q≤3을 만족하고, R1은 헤테로사이클릭기이며, R4는 헤테로사이클릭기, 탄소 포화 작용기, 또는 탄소 불포화 작용기이며, R2, R3, R5, 및 R6는 각각 독립적으로 수소 원자, C1-C7 알킬, C1-C7 알케닐기, C1-C7 사이클로알킬기, 또는 C1-C7 사이클로알케닐기이다. A silicon compound, a composition, and associated methods, the silicon compound being represented by Chemical Formula (1):R1m(OR2)n(OR3)3-m-nSi-O-SiR4p(OR5)q(OR6)3-p-q, Chemical Formula (1)wherein, in Chemical Formula (1), m, n, p, and q are each independently an integer of 0 to 3, and satisfy the following relations m+p≥1, m+n≤3, and p+q≤3, R1 is a heterocyclic group, R4 is a heterocyclic group, a carbon saturated group, or a carbon unsaturated group, and R2, R3, R5, and R6 are each independently a hydrogen atom, a C1-C7 alkyl group, a C2-C7 alkenyl group, a C3-C7 cycloalkyl group, or a C3-C7 cycloalkenyl group.