Substrate process apparatus and substrate process method using the same

Provided is a substrate processing method comprising the steps of: arranging a substrate in a drying chamber; and supplying a fluid to the drying chamber in which the substrate is arranged, wherein the step of supplying the fluid to the drying chamber comprises the steps of: supplying a gas to the d...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE KUNTACK, PARK JI HWAN, PARK SANGJINE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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