전기 도금 배스들 내의 용해된 가스 농도의 제어
용존 가스의 농도는 콘택터 (contactor) 를 통해 전기 도금 용액을 따르고, 콘택터 내의 압력을 제어하고 이에 따라 전기 도금 용액의 용존 가스의 농도를 제 1 농도 범위 내로 유지함으로써 제어될 수 있다. 제 1 농도 범위는 0이 아니고 아포화 (sub-saturation) 이다. A concentration of a dissolved gas can be controlled by following an electroplating solution through a contactor, controlling a pressure...
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| creator | BLICKENSDERFER JACOB KURTIS WILMOT FREDERICK DEAN VENKATRAMAN KAILASH CHUA LEE PENG KEARNS GREGORY J RASH ROBERT |
| description | 용존 가스의 농도는 콘택터 (contactor) 를 통해 전기 도금 용액을 따르고, 콘택터 내의 압력을 제어하고 이에 따라 전기 도금 용액의 용존 가스의 농도를 제 1 농도 범위 내로 유지함으로써 제어될 수 있다. 제 1 농도 범위는 0이 아니고 아포화 (sub-saturation) 이다.
A concentration of a dissolved gas can be controlled by following an electroplating solution through a contactor, controlling a pressure within the contactor, and thereby maintaining the concentration of the dissolved gas in the electroplating solution within a first concentration range. The first concentration range is non-zero and sub-saturation. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20230169826A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20230169826A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20230169826A3</originalsourceid><addsrcrecordid>eNrjZHB4s6Dl1Y4NCq_7gVSHwusNG950LXk9eYnC66Ytb-bOUHgza-XbqVteT5ij8GpDA1BK4XVbL1AtWGrBnDfTtvAwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDI2MDQzNLCyMzR2PiVAEA-49Dbw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>전기 도금 배스들 내의 용해된 가스 농도의 제어</title><source>esp@cenet</source><creator>BLICKENSDERFER JACOB KURTIS ; WILMOT FREDERICK DEAN ; VENKATRAMAN KAILASH ; CHUA LEE PENG ; KEARNS GREGORY J ; RASH ROBERT</creator><creatorcontrib>BLICKENSDERFER JACOB KURTIS ; WILMOT FREDERICK DEAN ; VENKATRAMAN KAILASH ; CHUA LEE PENG ; KEARNS GREGORY J ; RASH ROBERT</creatorcontrib><description>용존 가스의 농도는 콘택터 (contactor) 를 통해 전기 도금 용액을 따르고, 콘택터 내의 압력을 제어하고 이에 따라 전기 도금 용액의 용존 가스의 농도를 제 1 농도 범위 내로 유지함으로써 제어될 수 있다. 제 1 농도 범위는 0이 아니고 아포화 (sub-saturation) 이다.
A concentration of a dissolved gas can be controlled by following an electroplating solution through a contactor, controlling a pressure within the contactor, and thereby maintaining the concentration of the dissolved gas in the electroplating solution within a first concentration range. The first concentration range is non-zero and sub-saturation.</description><language>kor</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231218&DB=EPODOC&CC=KR&NR=20230169826A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231218&DB=EPODOC&CC=KR&NR=20230169826A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BLICKENSDERFER JACOB KURTIS</creatorcontrib><creatorcontrib>WILMOT FREDERICK DEAN</creatorcontrib><creatorcontrib>VENKATRAMAN KAILASH</creatorcontrib><creatorcontrib>CHUA LEE PENG</creatorcontrib><creatorcontrib>KEARNS GREGORY J</creatorcontrib><creatorcontrib>RASH ROBERT</creatorcontrib><title>전기 도금 배스들 내의 용해된 가스 농도의 제어</title><description>용존 가스의 농도는 콘택터 (contactor) 를 통해 전기 도금 용액을 따르고, 콘택터 내의 압력을 제어하고 이에 따라 전기 도금 용액의 용존 가스의 농도를 제 1 농도 범위 내로 유지함으로써 제어될 수 있다. 제 1 농도 범위는 0이 아니고 아포화 (sub-saturation) 이다.
A concentration of a dissolved gas can be controlled by following an electroplating solution through a contactor, controlling a pressure within the contactor, and thereby maintaining the concentration of the dissolved gas in the electroplating solution within a first concentration range. The first concentration range is non-zero and sub-saturation.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB4s6Dl1Y4NCq_7gVSHwusNG950LXk9eYnC66Ytb-bOUHgza-XbqVteT5ij8GpDA1BK4XVbL1AtWGrBnDfTtvAwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDI2MDQzNLCyMzR2PiVAEA-49Dbw</recordid><startdate>20231218</startdate><enddate>20231218</enddate><creator>BLICKENSDERFER JACOB KURTIS</creator><creator>WILMOT FREDERICK DEAN</creator><creator>VENKATRAMAN KAILASH</creator><creator>CHUA LEE PENG</creator><creator>KEARNS GREGORY J</creator><creator>RASH ROBERT</creator><scope>EVB</scope></search><sort><creationdate>20231218</creationdate><title>전기 도금 배스들 내의 용해된 가스 농도의 제어</title><author>BLICKENSDERFER JACOB KURTIS ; WILMOT FREDERICK DEAN ; VENKATRAMAN KAILASH ; CHUA LEE PENG ; KEARNS GREGORY J ; RASH ROBERT</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230169826A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2023</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>BLICKENSDERFER JACOB KURTIS</creatorcontrib><creatorcontrib>WILMOT FREDERICK DEAN</creatorcontrib><creatorcontrib>VENKATRAMAN KAILASH</creatorcontrib><creatorcontrib>CHUA LEE PENG</creatorcontrib><creatorcontrib>KEARNS GREGORY J</creatorcontrib><creatorcontrib>RASH ROBERT</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BLICKENSDERFER JACOB KURTIS</au><au>WILMOT FREDERICK DEAN</au><au>VENKATRAMAN KAILASH</au><au>CHUA LEE PENG</au><au>KEARNS GREGORY J</au><au>RASH ROBERT</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>전기 도금 배스들 내의 용해된 가스 농도의 제어</title><date>2023-12-18</date><risdate>2023</risdate><abstract>용존 가스의 농도는 콘택터 (contactor) 를 통해 전기 도금 용액을 따르고, 콘택터 내의 압력을 제어하고 이에 따라 전기 도금 용액의 용존 가스의 농도를 제 1 농도 범위 내로 유지함으로써 제어될 수 있다. 제 1 농도 범위는 0이 아니고 아포화 (sub-saturation) 이다.
A concentration of a dissolved gas can be controlled by following an electroplating solution through a contactor, controlling a pressure within the contactor, and thereby maintaining the concentration of the dissolved gas in the electroplating solution within a first concentration range. The first concentration range is non-zero and sub-saturation.</abstract><oa>free_for_read</oa></addata></record> |
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| title | 전기 도금 배스들 내의 용해된 가스 농도의 제어 |
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