절연막 형성용 감방사선성 조성물, 패턴을 갖는 수지막 및 반도체 회로 기판

다관능 말레이미드 화합물 (A-1) 및 다관능 스티릴 화합물 (A-2)로부터 선택되는 적어도 1종의 다관능 화합물 (A), 상기 다관능 말레이미드 화합물 (A-1)의 말레이미드기, 또는 다관능 스티릴 화합물 (A-2)의 스티릴기와 반응하는 기 Y를 갖는 중합체 (B) 및 광중합 개시제 (C)를 함유하고, 상기 중합체 (B)가, 특정한 반복 구조 단위를 갖는 중합체이고, 상기 기 Y가 하기 식 (Y1)로 표현되는, 절연막 형성용 감방사선성 조성물. JPEGpct00042.jpg2352 One embodiment of the present invention relates to a polymer, a composition, a cured product, a laminate, or an electronic component, and the polymer has a repeating structural unit represented by Formula (1) and has a group Y represented by Formula (a) at a terminal:wherein X's are each independently -O-, -S-, or - N(R3)-, R3 is a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms, or a group obtained by substituting a part of the hydrocarbon group or the halogenated hydrocarbon group with at least one selected from an oxygen atom and a sulfur atom, R1 is a divalent organic group, and R2 is a divalent unsubstituted or substituted nitrogen-containing heteroaromatic ring; -Y (a)wherein Y is a group containing an ethylenically unsaturated double bond and having 3 to 50 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 50 carbon atoms, an unsubstituted or substituted aliphatic hydrocarbon group having 6 to 50 carbon atoms, or an unsubstituted nitrogen-containing heteroaromatic ring, and when the aromatic hydrocarbon group or the aliphatic hydrocarbon group has a substituent, the substituent is a group other than a hydroxy group.