COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

Provided is a compound represented by the chemical formula 1, which is non-polymeric. In the chemical formula 1, X is a group having a valency of r, each R^1 is independently an organic group containing an acid-labile group, m is an integer greater than or equal to 1, k is an integer from 1 to 5, r...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AQAD EMAD, PARK JONG KEUN, LEE CHOONG BONG, CUI LI, CEN YINJIE, HOELZEL CONNER A, COLEY SUZANNE M, CAMERON JAMES F
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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